2020 Â÷¼¼´ë ¸®¼Ò±×·¡ÇÇ Çмú´ëȸ

2020 Next Generation Lithography Conference
Nov. 18~19, 2020

Online Conference

Full Program
PS4
Metrology / Inspection
PS4-1
22
À¯¿¬ ´ëó ÆÐÅÏ Á¶»ç Çö¹Ì°æÀ» ÀÌ¿ëÇÑ 3Â÷¿ø Çü»ó ÃøÁ¤ ±â¼ú
Á¤È¿ºó, ÁֱⳲ(Á¶¼±´ëÇб³)
PS4-2
22
±¤Çаè ÃøÁ¤À» À§ÇÑ ´ÜÀÏ ¿µ»ó Æí±¤ ºÐ»ê °£¼·°è Single shot polarized spectrally-resolved interferometry for optical testing
¹ÚÈ¿¹Ì, ÁֱⳲ(Á¶¼±´ëÇб³)
PS4-3
20
´ÜÀÏ ¿µ»ó ºÐ±¤ Ÿ¿ø°èÃø±â ±â¹Ý ´ÙÃþ ¹Ú¸· ºÐ¼® ±â¼ú ¿¬±¸
±ÇÀÇÇõ, ±èÁø¼·, ÁֱⳲ(Á¶¼±´ëÇб³)
PS4-4
7
Calibration of spot array inspection system of digital maskless lithography with spatially variant deconvolution 
°íÀ±Çõ, ÀÌâ¹Î, ÇÑÀç¿ø(¿¬¼¼´ëÇб³)
PS4-5
5
´ëÇü Æò¸é ¹Ý»ç°æ ÃøÁ¤À» À§ÇÑ ÀÌÁß Á¤ÇÕ ÃøÁ¤¹ý
±è°íÀº(°úÇбâ¼ú¿¬ÇÕ´ëÇпø´ëÇб³), ¾çÈ£¼ø(Çѱ¹Ç¥ÁذúÇבּ¸¿ø)
PS4-6
7
´ÙÃþ ±âÆÇÀÇ Àüü µÎ²² ÃøÁ¤À» À§ÇÑ ±¤°£¼·°è °³¹ß
¹èÀç¼®(°úÇбâ¼ú¿¬ÇÕ´ëÇпø´ëÇб³), ¹ÚÁ¤Àç, ÁøÁ¾ÇÑ(Çѱ¹Ç¥ÁذúÇבּ¸¿ø)
PS4-7
10
¹Ì¼¼ ÆÐÅÏÀÇ Á¤¹Ð »ïÂ÷¿ø ÃøÁ¤À» À§ÇÑ ±¤ÇÐ ÃøÁ¤¹ý °³¹ß
¾ÈÈêºñ(°úÇбâ¼ú¿¬ÇÕ´ëÇпø´ëÇб³), ¹ÚÁ¤Àç, ÁøÁ¾ÇÑ(Çѱ¹Ç¥ÁذúÇבּ¸¿ø)
PS4-8
5
ÀÏüÇü Æí±¤°£¼·¸ðµâ ±â¹Ý ½Ç½Ã°£ ºÐ±¤Å¸¿øÆí±¤°èÀÇ calibration ¹æ¹ý ¿¬±¸
ÃÖ¼®Çö(ÀüºÏ´ëÇб³/Çѱ¹Ç¥ÁذúÇבּ¸¿ø), ±è´ë¼®(ÀüºÏ´ëÇб³), Á¶¿ëÀç, Á¦°¥¿ø(Çѱ¹Ç¥ÁذúÇבּ¸¿ø)
PS4-9
4
¸ÖƼ ÀüÀÚºö ½Ã½ºÅÛÀ» À§ÇÑ ¿þÀÌÆÛ ½ºÄÉÀÏ ÃʼÒÇü ÀüÀÚÄ®·³ÀÇ µðÇ÷ºÅÍ ¼³°è ¿¬±¸
ÀÌ¿µº¹, ±èÇü¿ì, ±è´ë¿í, ¾È½ÂÁØ, ¿ÀŽÄ, ±èÈ£¼·(¼±¹®´ëÇб³)
PS4-10
5
Optimal grid pattern design required for 3D profile measurement using HiLo microscopy
·ùÀΰÇ, ±èÇý»ó, ±è´ë±Ù(´Ü±¹´ëÇб³)
PS4-11
5
SEMÀ» ÀÌ¿ëÇÑ ±×·¡ÇÉ/MoS2 ¹Ú¸·ÀÇ µÎ²² ÃøÁ¤¿¬±¸
¹Úº´Ãµ(Çѱ¹Ç¥ÁذúÇבּ¸¿ø), Rakesh Sadanand Sharbidre(Korea Research Institute of Standards and Science), È«¼º±¸(Çѱ¹Ç¥ÁذúÇבּ¸¿ø)