2020 차세대 리소그래피 학술대회

2020 Next Generation Lithography Conference
Nov. 18~19, 2020

Online Conference

Full Program
11월 19일 (목요일)
T-CL I
Modeling / Computational Lithography I
좌장 : 윤제범(Mentor Graphics) 14:40-16:10
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T-CL I-1
0
기계학습 방식을 활용한 결함 검출 방법 : SONR (State Of Nature Reduction)
이종원(Mentor Graphics. A Siemens Business)
T-CL I-2
0
Machine Learning Techniques for OPC Improvement at the Sub-5 nm Node
Changsoo Kim, Seungjong Lee, Sangwoo Park, No-Young Chung, Jungmin Kim, Narae Bang, Sanghwa Lee, SooRyong Lee(Samsung Electronics), Robert Boone, Pengcheng Li, Jiyoon Chang, Xinxin Zhou, YoungMi Kim, MinSu Oh, Minsung Kim, Rachit Gupta, Jun Ye, Stanislas Baron(ASML US)
T-CL I-3
0
Machine Learning-Based Layout Synthesis
Pervaiz Kareem, Yonghwi Kwon, Youngsoo Shin(KAIST)
T-CL I-4
0
Computational Sub-10 nm Plasmonic Nanogap Patterns by Block Copolymer Self-Assembly
김상곤(홍익대학교)