2020 차세대 리소그래피 학술대회

2020 Next Generation Lithography Conference
Nov. 18~19, 2020

Online Conference

Full Program
11월 18일 (수요일)
W-EU I
Extreme UV / Optical Lithography I
좌장 : 현윤석(ASML) 16:05-17:35
온라인 발표장 바로가기
W-EU I-1
1
Large field-of-view and high-sensitivity APMI with RESCAN
H. Kim(Paul Scherrer Institute), R. Nebling, A. Dejkameh, T. Shen(Paul Scherrer Institute. ETH in Zurich), D. Kazazis, Y. Ekinci, I. Mochi(Paul Scherrer Institute)
W-EU I-2
0
Actinic Tools Using Coherent EUV Source for High Volume Manufacturing
이동근(주식회사 이솔)
W-EU I-3
0
TEUS – laser produced plasma EUV light source with high brightness and low debris
Konstantin Koshelev(RnD-ISAN/EUV Labs. Institute for Spectroscopy RAS (Troitsk)), Alexander Vinokhodov, Alexander Lash(RnD-ISAN/EUV Labs (Troitsk)), Mikhail Krivokorytov(RnD-ISAN/EUV Labs. Institute for Spectroscopy RAS (Troitsk)), Vladimir Krivtsun(Institute for Spectroscopy RAS (Troitsk)), Vyacheslav Medvedev(RnD-ISAN/EUV Labs (Troitsk)), Denis Glushkov, Samir Ellwi(ISTEQ)
W-EU I-4
2
레이저 유도 플라즈마에서의 극자외선 발생 효율 향상
임창환(한국원자력연구원)